| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus capable of performing stable film production even on a base plate with a large area by uniformizing an electric field distribution and a plasma distribution. <P>SOLUTION: A vacuum processing apparatus 1 has: a discharge chamber 2 composed of a ridge waveguide having ridge electrodes 21a, 21b and non-ridge electrodes 22a, 22b; converters 3A, 3B composed of a ridge waveguide having ridge parts 31a, 31b and non-ridge parts 32a, 32b; discharge means 9 for discharging gas inside the discharge chamber 2 and the converters 3A, 3B; mother gas supply means 10 for supplying mother gas between the ridge electrodes. In the case that d<SB POS="POST">1</SB>defines a distance between confronting faces of the ridge electrodes 21a, 21b, a<SB POS="POST">0</SB>defines the width of the ridge waveguides of the discharge chamber 2 and the converters 3A, 3B, l<SB POS="POST">1</SB>defines the length of the ridge waveguide of the discharge chamber 2, and λ defines a wavelength in vacuum of supplied high-frequency power, the vacuum processing apparatus 1 respectively satisfies the following expressions within the range of allowing fluctuation of ±2%: d<SB POS="POST">1</SB>=0.004λ, a<SB POS="POST">0</SB>=0.72λ, l<SB POS="POST">1</SB>=0.52λ. <P>COPYRIGHT: (C)2013,JPO&INPIT |
