发明名称 |
CONDUCTIVE PATTERN FORMATION SUBSTRATE AND MANUFACTURING METHOD OF THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a conductive pattern formation substrate which reduces the visibility of a pattern, and to provide a manufacturing method of the conductive pattern formation substrate. <P>SOLUTION: A conductive pattern formation substrate includes: a base material 2; a conductive pattern 5 including a metal nanowire and provided on the base material 2; an insulation pattern 6 contacting with the conductive pattern 5 and provided at a region different from a region where the conductive pattern 5 is formed; and a light diffusion layer 9 which at least partially covers at least one of the conductive pattern 5 and the insulation pattern 6. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013098050(A) |
申请公布日期 |
2013.05.20 |
申请号 |
JP20110240468 |
申请日期 |
2011.11.01 |
申请人 |
SHIN ETSU POLYMER CO LTD |
发明人 |
NISHIZAWA KOJI;KOMATSU HIROTO;HOTTA SHINJI |
分类号 |
H01B13/00;B32B15/08;G02B5/02;G06F3/041;H01B5/14 |
主分类号 |
H01B13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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