| 摘要 |
<P>PROBLEM TO BE SOLVED: To keep a wiping member for wiping a substrate clean, without a complex device structure, and to efficiently remove a coating film. <P>SOLUTION: In a coating film removal device 1 of the present invention, a force point part 38 of a wiping device 36 is pressed by dropping a substrate 25 with a lifting mechanism 29, thereby a wiping member 27 immersed in a solvent 40 is lifted and at least a part of the wiping member is exposed from a liquid surface. Subsequently, in a state where the wiping member 27 is brought into contact with a lower end and inner and outer faces of the lower end of the substrate 25 by a wiping member lifting mechanism 44 for bringing the wiping member 27 into contact with the lower end and the inner and outer faces of the lower end of the substrate 25, the wiping member 27 and the substrate 25 are relatively rotated by a rotation mechanism 30 and thereby a coating film is removed. <P>COPYRIGHT: (C)2013,JPO&INPIT |
