| 摘要 |
<P>PROBLEM TO BE SOLVED: To easily and accurately perform mutual positioning of a discharge chamber and a converter with a simple and inexpensive configuration and to efficiently perform high quality vacuum processing by eliminating an adverse effect due to heat expansion of the discharge chamber. <P>SOLUTION: A film forming device 1 has a process chamber 1 composed of a ridge waveguide housed inside a decompression container 4, and converters 3A, 3B connected to the process chamber 2 through vacuum windows 15 provided in the decompression container 4, from the outside of the decompression container 4. Both surfaces of the vacuum windows 15 are provided with guide plates 51, 52 for positioning a container of the process chamber 2 and containers of the converters 3A, 3B at a home position with respect to the vacuum windows 15. The guide plates 51, 51 on both surfaces of the vacuum windows 15 are also shared as a conductive reflection wave reduction member for relaxing a sudden change in impedances between the process chamber 2 and the vacuum windows 15, and between the converters 3A, 3B and the vacuum windows 15. <P>COPYRIGHT: (C)2013,JPO&INPIT |
