| 摘要 |
<P>PROBLEM TO BE SOLVED: To generate plasma so as to extend from a tip end of a radiation conductor in a tube length direction. <P>SOLUTION: A plasma processing apparatus 1 includes: a housing 11 in which one end is blocked by a blocking plate 11b and the other end has a cylindrical body 11a having an ejection port 25 formed therein; and a rod-like radiator 14 erected on an inner face of the blocking plate 11b so as to extend in a tube length direction of the housing 11, for emitting an inputted high frequency signal S1. While a gas supply unit 4 supplies an electric discharge gas G into the housing 11, and the radiator 14 emits the high frequency signal S1, the apparatus 1 generates plasma P extending from the vicinity of a tip end of the radiator 14 toward the outside of the housing 11 through the ejection port 25. In an inner face of the housing 11, there are formed a plurality of gas discharge ports 22 for discharging the electric discharge gas G supplied from the gas supply unit 4 into the housing 11 in directions different from each other. <P>COPYRIGHT: (C)2013,JPO&INPIT |
