发明名称 Spacer Wafer For Wafer-Level Camera And Method For Manufacturing Same
摘要 A spacer wafer for a wafer-level camera, a wafer-level camera including the spacer wafer and a method of manufacturing a spacer wafer include a layer of photoresist being formed over a substrate, the layer of photoresist being exposed to radiation through a mask that defines a spacer geometry for at least one wafer-level camera element. The layer photoresist is developed, such that the layer of photoresist is the spacer wafer for the wafer-level camera.
申请公布号 US2013122247(A1) 申请公布日期 2013.05.16
申请号 US201113293937 申请日期 2011.11.10
申请人 BARNES GEORGE;RAUKER GORAN;OMNIVISION TECHNOLOGIES, INC. 发明人 BARNES GEORGE;RAUKER GORAN
分类号 B32B3/10;B32B3/00;B32B7/02;B32B9/04;B32B27/38;G03F7/20 主分类号 B32B3/10
代理机构 代理人
主权项
地址