发明名称 |
Spacer Wafer For Wafer-Level Camera And Method For Manufacturing Same |
摘要 |
A spacer wafer for a wafer-level camera, a wafer-level camera including the spacer wafer and a method of manufacturing a spacer wafer include a layer of photoresist being formed over a substrate, the layer of photoresist being exposed to radiation through a mask that defines a spacer geometry for at least one wafer-level camera element. The layer photoresist is developed, such that the layer of photoresist is the spacer wafer for the wafer-level camera.
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申请公布号 |
US2013122247(A1) |
申请公布日期 |
2013.05.16 |
申请号 |
US201113293937 |
申请日期 |
2011.11.10 |
申请人 |
BARNES GEORGE;RAUKER GORAN;OMNIVISION TECHNOLOGIES, INC. |
发明人 |
BARNES GEORGE;RAUKER GORAN |
分类号 |
B32B3/10;B32B3/00;B32B7/02;B32B9/04;B32B27/38;G03F7/20 |
主分类号 |
B32B3/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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