发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To inhibit loop oscillation in an odd mode without using an epitaxial resistance and a resistor chip. <P>SOLUTION: A semiconductor device manufacturing method comprises: a step of forming a metal layer 60; and a step of patterning the metal layer 60 by using as a mask, a plating layer 64 having a pattern excluding a part of a pattern of a gate bus line 26 to which gate fingers 14 of a plurality of FETs are commonly connected, and a second mask layer 66 covering the part of region to form a gate bus line 26. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013093477(A) 申请公布日期 2013.05.16
申请号 JP20110235436 申请日期 2011.10.26
申请人 SUMITOMO ELECTRIC DEVICE INNOVATIONS INC 发明人 KAJII KIYOSHI
分类号 H01L21/338;H01L21/3205;H01L21/768;H01L21/822;H01L23/532;H01L27/04;H01L29/778;H01L29/812 主分类号 H01L21/338
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