| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition, a method for forming a resist pattern, a polymer compound, and a novel compound. <P>SOLUTION: A resist composition which generates an acid by exposure and a solubility of which in a developer is changed by an action of an acid. The composition contains a base component (A) whose solubility in a developer is changed by an action of an acid. The base component (A) contains a resin component (A1) having a structural unit (a0-1) represented by formula (a0-1). In the formula, R represents a hydrogen atom, a 1-5C alkyl group or a 1-5C halogenated alkyl group. <P>COPYRIGHT: (C)2013,JPO&INPIT |
