发明名称 RECYCLING METHOD FOR POLISHING AGENT
摘要 <p>The purpose of the present invention is to provide a recycling method which achieves a high removal efficiency for a silicon component and an aluminum component and thus makes it possible to recover simply a polishing agent having polishing performance equivalent to that of a fresh polishing agent from a spent cerium oxide-based glass-polishing agent. A recycling method for recovering a polishing agent from a spent cerium oxide-based glass-polishing agent, including adjusting the pH of a spent cerium oxide-based glass-polishing agent slurry to 0.5 to 3.0.</p>
申请公布号 WO2013069720(A1) 申请公布日期 2013.05.16
申请号 WO2012JP78942 申请日期 2012.11.08
申请人 DOWA ECO-SYSTEM CO., LTD. 发明人 UEHARA, TAISHI;FUJITA, KOJI;HONMA, YOSHIHIRO
分类号 B24B57/00;B24B37/00 主分类号 B24B57/00
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