发明名称 METHOD FOR ANALYZING SEMICONDUCTOR SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To determine presence or absence of a DZ in a semiconductor substrate having the DZ thereon. <P>SOLUTION: The method for analyzing the semiconductor substrate includes: measuring a lifetime &tau;<SB POS="POST">11</SB>in a primary mode of a first sample of which a surface recombination rate has been adjusted to 1&times;10<SP POS="POST">4</SP>cm/sec or more, in a semiconductor substrate having a DZ thereon and an IG layer therein; determining a bulk lifetime &tau;<SB POS="POST">IG</SB>of the IG layer using the lifetime &tau;<SB POS="POST">11</SB>in the primary mode and the following formula; measuring a lifetime &tau;<SB POS="POST">12</SB>in a primary mode of a second sample of which a surface recombination rate has been adjusted to 1&times;10<SP POS="POST">2</SP>cm/sec or more with respect to the first sample; comparing the lifetime &tau;<SB POS="POST">12</SB>in the primary mode with the bulk lifetime &tau;<SB POS="POST">IG</SB>of the IG layer; and determining that the DZ has disappeared when a difference between the lifetime &tau;<SB POS="POST">12</SB>in the primary mode and the bulk lifetime &tau;<SB POS="POST">IG</SB>of the IG layer becomes 0. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013093434(A) 申请公布日期 2013.05.16
申请号 JP20110234579 申请日期 2011.10.26
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 SHINOHARA SOJI;HANAOKA KAZUYA;TSUYA HIDEKI
分类号 H01L21/322;H01L21/02;H01L21/265;H01L21/66;H01L27/12 主分类号 H01L21/322
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