| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mold release film, the surface of which to be released can be restrained from being contaminated since a mold release layer is formed by using the silica, as a main component, which is obtained by subjecting a hydrolysate of polyalkoxysiloxane, that has the volatility much lower than that of alkoxy siloxanes being organosilanes, to a condensation reaction. <P>SOLUTION: The mold release layer 3, which is based on the silica obtained by subjecting the hydrolysate of polyalkoxysiloxane having much lower volatility to the condensation reaction, is layered on at least one main surface of a film-shaped base material 2 by means of a hydrogen bond and/or a covalent bond, which is created by the condensation reaction of the hydrogen bond, by using a catalyst for accelerating the condensation reaction, in which catalyst chlorine, sulfur, phosphorus and aluminum are not contained. As a result, the surface of the mold release film to be released can be restrained from being contaminated since there is no risk of transferring alkyl silane being low-molecular-weight organosilane or low-molecular-weight cyclic siloxane in the same manner as the risk of the conventional mold release film. <P>COPYRIGHT: (C)2013,JPO&INPIT |
