| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic resist composition capable of reducing generation of defects such as coating defects and pattern defects. <P>SOLUTION: A production method of a lithographic resist composition is provided, including at least a step of filtering a lithographic resist composition through a filter. In the filtering step, after a colloidal sol is made to pass from an upstream side of a filter 3 to adsorb colloidal particles to the filter, the lithographic resist composition is made to pass through the filter to remove minute particles in the lithographic resist composition. In the figure, symbols 1, 6, 7 represent a tank; 2, 4 represent a liquid feed pump; 3 represents a filter container; 5 represents a filling container; 8 represents a drain; 9 represents a discharge valve; and 10 represents a secondary valve. <P>COPYRIGHT: (C)2013,JPO&INPIT |
