SUSCEPTOR FOR IMPROVING THROUGHPUT AND REDUCING WAFER DAMAGE

摘要

PROBLEM TO BE SOLVED: To provide a susceptor for supporting a semiconductor wafer in a heated chamber having an interior space.

SOLUTION: A susceptor 10 includes a body 20 having an upper surface 24 and a lower surface 26 opposite to the upper surface 24. The susceptor 10 also has a recess extending downward from the upper surface 24 into the body 20 along an imaginary central axis 22. The recess is sized and shaped for receiving a semiconductor wafer 12 therein. The susceptor 10 includes a plurality of lift pin openings extending through the body 20 from the recess to the lower surface 26. Each of the lift pin openings is sized for accepting lift pins to selectively lift and lower the wafer with respect to the recess. The susceptor 10 has a central opening extending through the body 20 along the central axis 22 from the recess to the lower surface 26.

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