METHOD AND APPARATUS FOR HEAT TREATING THE WAFER-SHAPED BASE MATERIAL OF A SOLAR CELL, IN PARTICULAR A CRYSTALLINE OR POLYCRYSTALLINE SILICON SOLAR CELL
摘要
A method and an apparatus for heat treating a wafer-shaped base material of a solar cell, in particular of a crystalline or polycrystalline silicon solar cell, wherein the device comprises at least one laser light source (4a, 4b).
申请公布号
US2013119030(A1)
申请公布日期
2013.05.16
申请号
US201113576464
申请日期
2011.02.03
申请人
HARTEN PAUL ALEXANDER;LIMO PATENTVERWALTUNG GMBH & CO. KG