发明名称 |
GAS SENSOR ELEMENT TREATMENT METHOD |
摘要 |
A gas sensor element is heated at a temperature of 500° C. or higher for 15 minutes or more in a treatment atmosphere containing one or more gases selected from the gas group consisting of nitrogen (N2), oxygen (O2), carbon monoxide (CO), hydrogen (H2) and hydrocarbons (HC) and giving an air ratio of 0.80 to 1.10. In a gas sensor element to which such a treatment has been applied, a stable output is obtained without causing overshoot to an actual NOx concentration (input) even when a rapid exhaust gas change takes place.
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申请公布号 |
US2013122441(A1) |
申请公布日期 |
2013.05.16 |
申请号 |
US201213684804 |
申请日期 |
2012.11.26 |
申请人 |
NGK INSULATORS, LTD.;NGK INSULATORS, LTD. |
发明人 |
NAKAGAKI KUNIHIKO;LEE SANG JAE;MASUO SUMIKO |
分类号 |
F27D7/00 |
主分类号 |
F27D7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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