| 发明名称 |
Novel Passivation Composition and Process |
| 摘要 |
This disclosure relates to a passivation composition containing at least one sulfonic acid, at least one compound containing a nitrate or nitrosyl ion, and water. The passivation composition is substantially free of a halide ion.
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| 申请公布号 |
US2013122701(A1) |
申请公布日期 |
2013.05.16 |
| 申请号 |
US201213657367 |
申请日期 |
2012.10.22 |
| 申请人 |
FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.;FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. |
发明人 |
KRUPA FRANK J.;WOJTCZAK WILLIAM A.;DU BING;TAKAHASHI TOMONORI |
| 分类号 |
C23F1/44;H01L21/02 |
主分类号 |
C23F1/44 |
| 代理机构 |
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