| 发明名称 |
RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, SPACER, AND DISPLAY |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin composition capable of suppressing an increase in the molecular weight of a copolymer (A1) obtained by polymerizing an unsaturated carboxylic acid (a1) and an epoxy group-containing unsaturated compound (a2), a photosensitive resin composition containing the same, a spacer formed of the photosensitive resin composition, and a display having the spacer. <P>SOLUTION: A resin composition containing an alkali-soluble resin (A) containing a copolymer (A1) obtained by polymerizing an unsaturated carboxylic acid (a1) and an epoxy group-containing unsaturated compound (a2), and a solvent (S) containing propylene glycol monomethyl ether acetate is blended with a compound represented by formula (1). <P>COPYRIGHT: (C)2013,JPO&INPIT |
| 申请公布号 |
JP2013091773(A) |
申请公布日期 |
2013.05.16 |
| 申请号 |
JP20120174371 |
申请日期 |
2012.08.06 |
| 申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
SHIODA MASARU;NODA KUNIHIRO;UEMATSU TERUHIRO |
| 分类号 |
C08L33/02;C08F2/44;C08K5/103;C08K5/17;C08L63/00;G02F1/1339;G03F7/004;G03F7/033 |
主分类号 |
C08L33/02 |
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