| 摘要 |
The invention relates to an assembly for feeding in HF current for rotatable tubular cathodes (1) in a vacuum chamber (4) of a plasma coating system, and a high-frequency current source (14) and a magnet assembly (7) located within the tubular cathode (1) and extending along the tubular cathode for producing a magnetic field (6). The aim of the invention is to create an assembly for feeding in HF current for tubular cathodes that enables a low-loss feed-in of the HF current in such a manner that especially homogeneous sputter removal from the tubular cathode is guaranteed. Said aim is achieved in that the HF current source (14) is coupled to the tubular cathode (1) within the vacuum chamber (4) by means of a capacitive HF feed-in (9) in the form of a coupling capacitor (18). The coupling capacitor (18) of the HF feed-in (9) comprises a part of the surface of the tubular cathode (1) and a metal plate or metal film (10), which surrounds the tubular cathode (1) at least partially at a specified distance. |
