发明名称 METHOD OF PREPARING SUBSTRATE
摘要 A substrate is prepared by polishing a surface of the substrate using a polishing pad while feeding a slurry. The polishing pad has a porous nap layer which comes in contact with the substrate surface and is made of a base resin comprising at least three resins, typically an ether resin, ester resin, and polycarbonate resin. The polished substrate has a highly flat surface with a minimal number of defects.
申请公布号 US2013122785(A1) 申请公布日期 2013.05.16
申请号 US201213675302 申请日期 2012.11.13
申请人 SHIN-ETSU CHEMICAL CO., LTD.;SHIN-ETSU CHEMICAL CO., LTD. 发明人 MATSUI HARUNOBU;HARADA DAIJITSU;WATABE ATSUSHI;UEDA SHUHEI;TAKEUCHI MASAKI
分类号 B24B37/04 主分类号 B24B37/04
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