发明名称 |
METHOD OF PREPARING SUBSTRATE |
摘要 |
A substrate is prepared by polishing a surface of the substrate using a polishing pad while feeding a slurry. The polishing pad has a porous nap layer which comes in contact with the substrate surface and is made of a base resin comprising at least three resins, typically an ether resin, ester resin, and polycarbonate resin. The polished substrate has a highly flat surface with a minimal number of defects.
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申请公布号 |
US2013122785(A1) |
申请公布日期 |
2013.05.16 |
申请号 |
US201213675302 |
申请日期 |
2012.11.13 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD.;SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
MATSUI HARUNOBU;HARADA DAIJITSU;WATABE ATSUSHI;UEDA SHUHEI;TAKEUCHI MASAKI |
分类号 |
B24B37/04 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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