发明名称 THIN-FILM TRANSISTOR DEVICE AND METHOD FOR MANUFACTURING THIN-FILM TRANSISTOR DEVICE
摘要 A thin-film transistor device includes: a gate electrode above a substrate; a gate insulating film on the gate electrode; a crystalline silicon thin film including a channel region which is provided on the gate insulating film; semiconductor films on at least the channel region; an insulating film made of an organic material which is provided over the channel region and above the semiconductor films; a source electrode over at least an end portion of the insulating film; and a drain electrode over at least the other end portion of the insulating film and facing the source electrode. The semiconductor films include at least a first semiconductor film and a second semiconductor film provided on the first semiconductor film. A relationship ECP<EC1 is satisfied where ECP and EC1 denote energy levels at lower ends of conduction bands of the crystalline silicon thin film and the first semiconductor film, respectively.
申请公布号 US2013119391(A1) 申请公布日期 2013.05.16
申请号 US201313737275 申请日期 2013.01.09
申请人 PANASONIC CORPORATION;PANASONIC LIQUID CRYSTAL DISPLAY CO., LTD.;PANASONIC LIQUID CRYSTAL DISPLAY CO., LTD.;PANASONIC CORPORATION 发明人 KANEGAE ARINOBU;KAWASHIMA TAKAHIRO;HAYASHI HIROSHI;KAWACHI GENSHIROU
分类号 H01L29/786;H01L29/66 主分类号 H01L29/786
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