发明名称 CHEMICAL BATH DEPOSITION SYSTEM
摘要 A chemical bath deposition system is used for forming a buffer layer on a back electrode substrate having a photoelectric transducing layer. The chemical bath deposition system includes a chemical bath tank, a chemical-solution purification device, and a dosing device. The chemical bath tank is used for storing a buffer-layer solution including cation and anion. The cation is adapted to react with the anion to form the buffer layer when the back electrode substrate is immersed in the buffer-layer solution. The chemical-solution purification device is communicated with the chemical bath tank for removing residual cation to obtain a purified solution after the cation reacts with the anion to form the buffer layer. The dosing device is for performing compensation of the cation according to a component ratio of a purified solution.
申请公布号 US2013118403(A1) 申请公布日期 2013.05.16
申请号 US201213467068 申请日期 2012.05.09
申请人 LEE SHIH-WEI;WANG LUNG-CHIEH;LIN CHIH-LUNG 发明人 LEE SHIH-WEI;WANG LUNG-CHIEH;LIN CHIH-LUNG
分类号 B05C3/09;B05C11/00 主分类号 B05C3/09
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