发明名称 |
CHEMICAL BATH DEPOSITION SYSTEM |
摘要 |
A chemical bath deposition system is used for forming a buffer layer on a back electrode substrate having a photoelectric transducing layer. The chemical bath deposition system includes a chemical bath tank, a chemical-solution purification device, and a dosing device. The chemical bath tank is used for storing a buffer-layer solution including cation and anion. The cation is adapted to react with the anion to form the buffer layer when the back electrode substrate is immersed in the buffer-layer solution. The chemical-solution purification device is communicated with the chemical bath tank for removing residual cation to obtain a purified solution after the cation reacts with the anion to form the buffer layer. The dosing device is for performing compensation of the cation according to a component ratio of a purified solution. |
申请公布号 |
US2013118403(A1) |
申请公布日期 |
2013.05.16 |
申请号 |
US201213467068 |
申请日期 |
2012.05.09 |
申请人 |
LEE SHIH-WEI;WANG LUNG-CHIEH;LIN CHIH-LUNG |
发明人 |
LEE SHIH-WEI;WANG LUNG-CHIEH;LIN CHIH-LUNG |
分类号 |
B05C3/09;B05C11/00 |
主分类号 |
B05C3/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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