发明名称 |
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, MASK BLANK AND METHOD OF FORMING PATTERN |
摘要 |
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that contains a structure (P) containing at least one phenolic hydroxyl group and a structure (Q) containing at least one phenolic hydroxyl group whose hydrogen atom is replaced by a group (S) with a cyclic structure containing an acid crosslinking group, characterized in that the group (S) with a cyclic structure containing an acid crosslinking group is a group with a polycyclic structure or a group with a cyclic structure containing a hydroxymethyl group and/or an alkoxymethyl group. |
申请公布号 |
WO2013069812(A1) |
申请公布日期 |
2013.05.16 |
申请号 |
WO2012JP79585 |
申请日期 |
2012.11.08 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
TSUCHIMURA, TOMOTAKA;TAKIZAWA, HIROO |
分类号 |
G03F7/038;C08F212/02;G03F7/004;H01L21/027 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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