发明名称 |
END POINT DETECTION IN GRINDING |
摘要 |
PURPOSE: A method for detecting an end point in a grinding process are provided to accurately detect the end point by using the reflectivity of light from the surface of a wafer. CONSTITUTION: Light emitting and receiving meters(60) are not contacted with a wafer(20) in a grinding process and measure reflectivity. The light emitting and receiving meters include a light emitting meter(60A) and a light receiving meter(60B). The light emitting meter measures emitted light(62). The light receiving meter receives reflected light(64).
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申请公布号 |
KR20130050228(A) |
申请公布日期 |
2013.05.15 |
申请号 |
KR20120006952 |
申请日期 |
2012.01.20 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
MAO YI CHAO;HUNG JUI PIN;LIN JING CHENG;JENG SHIN PUU;YU CHEN HUA |
分类号 |
H01L21/304;H01L21/66 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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