发明名称 END POINT DETECTION IN GRINDING
摘要 PURPOSE: A method for detecting an end point in a grinding process are provided to accurately detect the end point by using the reflectivity of light from the surface of a wafer. CONSTITUTION: Light emitting and receiving meters(60) are not contacted with a wafer(20) in a grinding process and measure reflectivity. The light emitting and receiving meters include a light emitting meter(60A) and a light receiving meter(60B). The light emitting meter measures emitted light(62). The light receiving meter receives reflected light(64).
申请公布号 KR20130050228(A) 申请公布日期 2013.05.15
申请号 KR20120006952 申请日期 2012.01.20
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 MAO YI CHAO;HUNG JUI PIN;LIN JING CHENG;JENG SHIN PUU;YU CHEN HUA
分类号 H01L21/304;H01L21/66 主分类号 H01L21/304
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