TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS

摘要

PURPOSE: A topcoat composition is provided to have improved receding contact angle for improving scan rate on an exposure tool for improved throughput. CONSTITUTION: A topcoat composition contains a matrix polymer with a larger weight ratio than the weight ratio of a surface-activated polymer. The topcoat composition has a polymer system which includes the matrix polymer and surface-activated polymer of which the surface energy is lower than the surface energy of the matrix polymer; and a solvent system which includes a first organic solvent and a second organic solvent. The surface energy of the first organic solvent is higher than the surface energy of the active polymer. The boiling point of the first organic solvent is higher than the boiling point of the second organic solvent.