| 发明名称 |
Apparatus and method for deposition for organic thin films |
| 摘要 |
The invention provides apparatus and methods for organic continuum vapor deposition of organic materials on large area substrates.
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| 申请公布号 |
US8440021(B2) |
申请公布日期 |
2013.05.14 |
| 申请号 |
US20090467468 |
申请日期 |
2009.05.18 |
| 申请人 |
FORREST STEPHEN R.;YANG FAN;LUNT RICHARD;THE REGENTS OF THE UNIVERSITY OF MICHIGAN |
发明人 |
FORREST STEPHEN R.;YANG FAN;LUNT RICHARD |
| 分类号 |
C23C16/00 |
主分类号 |
C23C16/00 |
| 代理机构 |
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代理人 |
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