Positive resist composition, method of forming resist pattern and polymeric compound

摘要

A positive resist composition including a base component (A') which exhibits increased solubility in an alkali developing solution under the action of acid and generates acid upon exposure, the base component (A') including a resin component (A1) having a structural unit (a0-1) represented by general formula (a0-1), a structural unit (a0-2) which generates acid upon exposure and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group (wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, and R3 represents a cyclic group containing -SO2- within the ring skeleton thereof).