发明名称 Compound, salt, and radiation-sensitive resin composition
摘要 A compound has a partial structure shown by a following formula (1), wherein R1 represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, R2 represents a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, L represents an integer from 0 to 4, n represents an integer from 0 to 10, and m represents an integer from 1 to 4.
申请公布号 US8440384(B2) 申请公布日期 2013.05.14
申请号 US20100760509 申请日期 2010.04.14
申请人 EBATA TAKUMA;NAGAI TOMOKI;JSR CORPORATION 发明人 EBATA TAKUMA;NAGAI TOMOKI
分类号 G03F7/039 主分类号 G03F7/039
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