发明名称 Cu pillar bump with non-metal sidewall protection structure
摘要 A sidewall protection structure is provided for covering at least a portion of a sidewall surface of a bump structure, in which a protection structure on the sidewalls of a Cu pillar and a surface region of an under-bump-metallurgy (UBM) layer is formed of at least one non-metal material layers, for example a dielectric material layer, a polymer material layer, or combinations thereof.
申请公布号 US8441124(B2) 申请公布日期 2013.05.14
申请号 US20100769768 申请日期 2010.04.29
申请人 WU YI-WEN;LIN CHENG-CHUNG;HWANG CHIEN LING;LIU CHUNG-SHI;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 WU YI-WEN;LIN CHENG-CHUNG;HWANG CHIEN LING;LIU CHUNG-SHI
分类号 H01L23/48;H01L23/52 主分类号 H01L23/48
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