发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR RESIST PATTERN FORMATION, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD |
摘要 |
<p>This invention provides a photosensitive resin composition comprising (A) a binder polymer comprising a divalent group represented by general formula (I), a divalent group represented by general formula (II), and a divalvent group represented by general formula(III), (B) a photopolymerizable compound, and (C) a photopolymerization initiator comprising a hexaarylbiimidazole compound containing at least one alkoxy group having 1 to 5 carbon atoms. (I) (II) (III) wherein R<SUP>1</SUP>, R<SUP>3</SUP>, and R<SUP>5</SUP> each independently represent a hydrogen atom or a methyl group; R<SUP>2</SUP> and R<SUP>4</SUP> each independently represent an alkyl group having 1 to 3 carbon atoms, an alkoxy group, an OH group, or a halogen atom; and m and n are each independently an integer of 0 to 5.</p> |
申请公布号 |
KR20130049836(A) |
申请公布日期 |
2013.05.14 |
申请号 |
KR20137010400 |
申请日期 |
2007.11.22 |
申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
MURAMATSU YUKIKO;MIYASAKA MASAHIRO;NANKAWA HANAKO |
分类号 |
G03F7/031;G03F7/004;G03F7/033;G03F7/26 |
主分类号 |
G03F7/031 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|