发明名称 METHOD AND APPARATUS FOR PRODUCING SILICON, SILICON WAFER AND PANEL FOR SOLAR CELL
摘要 <P>PROBLEM TO BE SOLVED: To provide a silicon production method capable of surely bringing a treating agent into contact with molten silicon in the case of removing impurities in molten silicon with the treating agent, thereby efficiently contributing to the reaction with impurities. <P>SOLUTION: The silicon production method comprises a pushing step of pushing the treating agent into the system at a level lower than the liquid level of the molten silicon in the system and a removal step of reacting the impurities in the molten silicon with the treating agent and removing the impurities from the system. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013086995(A) 申请公布日期 2013.05.13
申请号 JP20110226894 申请日期 2011.10.14
申请人 MITSUBISHI CHEMICALS CORP 发明人 ARITA YOJI;MIYAMOTO YUKIHIRO;KATAYAMA TOSHIAKI;YAMAHARA KEIJI
分类号 C01B33/037;H01L31/04 主分类号 C01B33/037
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