发明名称 |
METHOD AND APPARATUS FOR PRODUCING SILICON, SILICON WAFER AND PANEL FOR SOLAR CELL |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a silicon production method capable of surely bringing a treating agent into contact with molten silicon in the case of removing impurities in molten silicon with the treating agent, thereby efficiently contributing to the reaction with impurities. <P>SOLUTION: The silicon production method comprises a pushing step of pushing the treating agent into the system at a level lower than the liquid level of the molten silicon in the system and a removal step of reacting the impurities in the molten silicon with the treating agent and removing the impurities from the system. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013086995(A) |
申请公布日期 |
2013.05.13 |
申请号 |
JP20110226894 |
申请日期 |
2011.10.14 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
ARITA YOJI;MIYAMOTO YUKIHIRO;KATAYAMA TOSHIAKI;YAMAHARA KEIJI |
分类号 |
C01B33/037;H01L31/04 |
主分类号 |
C01B33/037 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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