| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition useful for EUV and EB and to provide a method for forming a resist pattern. <P>SOLUTION: A resist composition comprises a polymer (A1) having a structural unit (a5) including a group represented by general formula (a5-0-1) or (a5-0-2), in which an amount of monomers that derives the structural unit (a5) is 100 ppm or less based on the polymer (A1). In the formula, Q<SP POS="POST">1</SP>and Q<SP POS="POST">2</SP>represent a single bond or a divalent linking group. R<SP POS="POST">3</SP>, R<SP POS="POST">4</SP>and R<SP POS="POST">5</SP>represent an organic group, in which R<SP POS="POST">4</SP>and R<SP POS="POST">5</SP>may be bonded to each other to form a ring together with a sulfur atom in the formula with the proviso that the group -R<SP POS="POST">3</SP>-S<SP POS="POST">+</SP>(R<SP POS="POST">4</SP>)(R<SP POS="POST">5</SP>) in the formula has only one aromatic ring as a whole or does not have an aromatic ring. <P>COPYRIGHT: (C)2013,JPO&INPIT |
