SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND SUBSTRATE HOLDER MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate table or substrate holder on which one or more electronic components, such as one or more thin-film components, are to be formed.

SOLUTION: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness, and/or its outer surface has a peak-to-valley distance of less than 10 μm. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to burls to repel a solution of material of the planarization layer.

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