发明名称 METHOD FOR FORMING THROUGH HOLE IN INSULATING SUBSTRATE AND METHOD FOR MANUFACTURING INSULATING SUBSTRATE FOR INTERPOSER
摘要 <P>PROBLEM TO BE SOLVED: To provide a method in which dislocation hardly occurs in a formation position when forming a plurality of through holes in an insulating substrate. <P>SOLUTION: When forming the plurality of through holes in the insulating substrate using laser guiding type electric discharge technology, the through holes are formed from an objective position that is a centermost position and then positions for forming the through holes are expanded outward. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013086236(A) 申请公布日期 2013.05.13
申请号 JP20110231102 申请日期 2011.10.20
申请人 ASAHI GLASS CO LTD 发明人 TAKAHASHI SHINTARO;MORI SATORU
分类号 B23H7/38;B23H9/00;B23H9/14;B26F1/28;C03B33/08 主分类号 B23H7/38
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