发明名称 |
METHOD FOR FORMING THROUGH HOLE IN INSULATING SUBSTRATE AND METHOD FOR MANUFACTURING INSULATING SUBSTRATE FOR INTERPOSER |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method in which dislocation hardly occurs in a formation position when forming a plurality of through holes in an insulating substrate. <P>SOLUTION: When forming the plurality of through holes in the insulating substrate using laser guiding type electric discharge technology, the through holes are formed from an objective position that is a centermost position and then positions for forming the through holes are expanded outward. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013086236(A) |
申请公布日期 |
2013.05.13 |
申请号 |
JP20110231102 |
申请日期 |
2011.10.20 |
申请人 |
ASAHI GLASS CO LTD |
发明人 |
TAKAHASHI SHINTARO;MORI SATORU |
分类号 |
B23H7/38;B23H9/00;B23H9/14;B26F1/28;C03B33/08 |
主分类号 |
B23H7/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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