发明名称 DEFECT INSPECTION METHOD FOR COLOR FILTER SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To solve the problem that conventional altitude calculation can cause errors due to mismatching of local regions, cannot obtain accurate altitude information, and spends a very long processing time. <P>SOLUTION: The defect inspection method for a color filter substrate which calculates altitude of a local region on the color filter substrate according to a stereophonic system to perform defect determination includes the steps of: detecting a local region from a basic image to be a picked-up image of one of stereo images; acquiring a reference image to be another picked-up image of the other stereo image that includes a local region; sorting a matching region including the local region from the stereo images; sorting a part to be a reference mark from the matching region; clarifying local regions; obtaining center coordinates of the clarified local regions and calculating a distance from the reference mark; obtaining parallax between local regions in the basic image and the reference image; and calculating altitude of the local region. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013088342(A) 申请公布日期 2013.05.13
申请号 JP20110230664 申请日期 2011.10.20
申请人 TOPPAN PRINTING CO LTD 发明人 EGAWA SHINICHI
分类号 G01B11/30;G01B11/245;G01N21/88;G06T1/00 主分类号 G01B11/30
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