发明名称 PLASMA CONTROL METHOD AND PLASMA CONTROL DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma control method that obtains a suitable plasma irradiation state for an object, and a plasma control device that has good cost performance and irradiates the object with plasma under a desired irradiation condition with high precision and good reproducibility. <P>SOLUTION: There are provided the plasma control method of controlling the state of the plasma when irradiating the object with the plasma, the plasma control method including detecting the state of the object and acquiring information on the state of the object, feeding the information on the state of the object back, and controlling the state of the plasma on the basis of the information on the state of the object; and plasma control device using the same. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013089331(A) 申请公布日期 2013.05.13
申请号 JP20110226378 申请日期 2011.10.14
申请人 OKINO AKITOSHI;MIYAHARA SHUICHI 发明人 OKINO AKITOSHI;MIYAHARA SHUICHI
分类号 H05H1/24 主分类号 H05H1/24
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