| 摘要 |
<p>Systems, methods and apparatus are provided for electromechanical systems devices having a sidewall spacer along at least one sidewall of a conductive line. An electromechanical systems device can include a sidewall spacer along at least one sidewall of a conductive line under a movable layer. The sidewall spacer can be sloped such that the sidewall spacer has a decreasing width away from a substrate under the movable layer. The conductive line can be configured to route an electrical signal to the electromechanical systems device. In some implementations, a black mask structure of an electromechanical systems device can include the conductive line.</p> |
