OXIDE SINTERED COMPACT AND SPUTTERING TARGET, AND METHOD FOR PRODUCING SAME

摘要

This oxide sintered compact is obtained by mixing and sintering zinc oxide, indium oxide, and an oxide of at least one metal selected from a group consisting of Ti, Mg, Al and Nb. When the oxide sintered compact is subjected to X-ray diffraction, ZnmIn2O3+m (where m is an integer from 5 to 7) phase is the main phase, and In2O3, and ZnO crystal phases are included, relative density is at least 85%, and specific resistance does not exceed 0.1Omegascm. According to this invention it is possible to obtain an oxide sintered compact having a low specific resistance and a high relative density.