发明名称 |
A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN |
摘要 |
The present invention relates to an aqueous composition for coating over a photoresist pattern comprising a first water soluble compound comprising at least a silicon moiety and at least one amino group, and a second compound comprising at least 1 carboxylic acid group. The invention further relates to processes for using the novel invention.
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申请公布号 |
KR20130048771(A) |
申请公布日期 |
2013.05.10 |
申请号 |
KR20137002188 |
申请日期 |
2011.07.27 |
申请人 |
AZ ELECTRONIC MATERIALS USA CORP. |
发明人 |
WU HENGPENG;LI MENG;CAO YI;YIN JIAN;LEE, DONG KWAN;HONG, SUNG EUN;PAUNESCU MARGARETA |
分类号 |
C09D183/08;C09D4/00;G03F7/075;G03F7/40 |
主分类号 |
C09D183/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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