PHENOLIC MONOMER, POLYMER FOR PREPARING RESIST UNDER-LAYER COMPRISING THE SAME, AND RESIST UNDER-LAYER COMPOSITION INCLUDING THE SAME

摘要

PURPOSE: A phenolic monomer is provided to ensure high transparency, high heat resistance, low reflection, and low shrinkage. CONSTITUTION: A phenolic monomer is denoted by chemical formula 1. A polymer for forming a resist layer contains a repeat unit denoted by chemical formula 2. The molecular weight of the polymer is 500-20,000. A resist film composition contains 1-25 wt% of the polymer and remaining amount of organic solvent. The organic solvent is selected from the group consisting of propylene glycol monomethyl ether acetate(PGMEA), propylene glycol monomethyl ether(PGME), cyclohexanone(CH), ethyl lactate(EL), gamma butyrolactone(GBL), and a mixture thereof.