POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF PRODUCING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, AND ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE

摘要

PURPOSE: A positive type photosensitive resin composition is provided to have high sensitivity, to have high resistance to a stripping composition or NMP, to have excellent adhesion to a transparent electrode film or metal and etching resistance. CONSTITUTION: A positive type photosensitive resin composition contains a polymer component, photoacid generator, a solvent, and a silica compound which has two or more hydrolyzable silyl group and/or silanol group represented by chemical formula X1. The polymer component includes a polymer which has a structure unit having a group protected by an acid-decomposable group and a structure unit having a crosslinkable group; and/or a polymer which has a structure unit having a group protected by an acid-decomposable group and a crosslinkable group.