| 摘要 |
The present invention relates to an apparatus and a method for subjecting a surface of a substrate (5) to successive surface reactions of at least a first precursor (A) and a second precursor (B). The apparatus comprises a reaction space (7) and a precursor system (6) for supplying the at least first and second precursors (A, B) to the reaction space (7).The precursor system (6) comprises a precursor vessel (10, 12), a precursor supply line (16, 18, 30) for supplying the precursor (A, B) from precursor vessel (10, 12) to the reaction space (2) and a dosing valve (22, 24, 32) provided to the precursor supply line (16, 18, 30). The apparatus further comprises a temperature sensor (8, 9, 11, 13, 15, 17, 19) arranged to the precursor system (6) in free gas space (16, 18, 30, 38) upstream of the dosing valve (22, 24, 32). |
