| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of setting an exposure device capable of shortening setting time for an exposure amount and a focus value. <P>SOLUTION: An exposure region is exposed in an exposure device in a state that an exposure amount and a focus value for forming a pattern of a preset dimension have been determined and a reference substrate in which the pattern has been formed is imaged to acquire reference data including luminance of the exposure region. Then, in an exposure device in a second state that one of the exposure amount and the focus value for forming the pattern of the dimension is not known, an inspection substrate in which a plurality of exposure regions have been set is exposed by changing the exposure amount and the focus value respectively for each exposure region to form the pattern. Furthermore, the inspection substrate in which the pattern has been formed is imaged to create inspection image data in which luminance for each exposure region has been specified and the exposure amount and the focus value for forming the pattern of the dimension in the second state are determined on the basis of the reference data and the inspection image data. <P>COPYRIGHT: (C)2013,JPO&INPIT |
