发明名称 LITHOGRAPHIC APPARATUS AND METHOD OF COOLING COMPONENT IN LITHOGRAPHIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus with a cooling system. <P>SOLUTION: A lithographic apparatus includes a component and a local cooler to apply a local cooling load to the component. The local cooler has a gas passageway, which includes a flow restrictor upstream of the component and is configured to direct a flow of gas exiting from the flow restrictor to cool a surface of the component. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013084934(A) 申请公布日期 2013.05.09
申请号 JP20120206553 申请日期 2012.09.20
申请人 ASML NETHERLANDS BV 发明人 FRANK JOHANNES JACOBUS VAN BOXTEL;VAN DER NET ANTONIUS JOHANNUS;LEONARDA HENDRIKA VAN DEN HEUVEL
分类号 H01L21/027;G03F7/20;H01L21/683 主分类号 H01L21/027
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