发明名称 |
LITHOGRAPHIC APPARATUS AND METHOD OF COOLING COMPONENT IN LITHOGRAPHIC APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus with a cooling system. <P>SOLUTION: A lithographic apparatus includes a component and a local cooler to apply a local cooling load to the component. The local cooler has a gas passageway, which includes a flow restrictor upstream of the component and is configured to direct a flow of gas exiting from the flow restrictor to cool a surface of the component. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013084934(A) |
申请公布日期 |
2013.05.09 |
申请号 |
JP20120206553 |
申请日期 |
2012.09.20 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
FRANK JOHANNES JACOBUS VAN BOXTEL;VAN DER NET ANTONIUS JOHANNUS;LEONARDA HENDRIKA VAN DEN HEUVEL |
分类号 |
H01L21/027;G03F7/20;H01L21/683 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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