METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To reduce manufacturing costs of a semiconductor device, to improve the aperture ratio of a semiconductor device, to make a display portion of a semiconductor device display a higher-definition image, and to provide a semiconductor device which can be operated at high speed.

SOLUTION: The semiconductor device includes a driver circuit portion and a display portion over one substrate. The driver circuit portion includes: a driver circuit TFT in which source and drain electrodes are formed of a metal and a channel layer is formed of an oxide semiconductor; and a driver circuit wiring formed of a metal. The display portion includes: a pixel TFT in which source and drain electrodes are formed of an oxide conductor and a semiconductor layer is formed of an oxide semiconductor; and a display wiring formed of an oxide conductor.

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