发明名称 NON-VOLATILE MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <p>PURPOSE: A non-volatile memory device and a method for manufacturing the same are provided to prevent a short circuit between common bit lines by misaligning a common bit line with an adjacent bit line. CONSTITUTION: An active region(200a) includes a string part(S) extended in a first direction and a bridge part(B) connecting an adjacent string part. A field region(200b) is formed between the active regions. A selection transistor and a memory cell are formed on the active region. Bit line contacts(240a,240b) are misaligned in a first direction and a second direction which is perpendicular to the first direction. A common bit line is connected to the bit line contacts.</p>
申请公布号 KR20130047851(A) 申请公布日期 2013.05.09
申请号 KR20110112648 申请日期 2011.11.01
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, KYOUNG HOON;KIM, HONG SOO;CHO, HOO SUNG
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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