| 摘要 |
<P>PROBLEM TO BE SOLVED: To form an uneven shape on a surface of a glass substrate in a region except a marginal part. <P>SOLUTION: A substrate processing apparatus comprises: an extension part 120 arranged so as to selectively cover a peripheral edge of a treatment surface of a substrate and extending from an inner wall on a gas supply part side in a vacuum vessel toward a substrate stage; a distance adjustment mechanism 20 which shortens, in substrate treatment, a distance between the peripheral edge of the treatment surface and the extension part so as to isolate a first space 101 surrounded by the gas supply part, the extension part and the treatment surface, and a second space 102 on an outer side of the first space from each other, and distances, in substrate exchange, the peripheral edge of the treatment surface of the substrate from the extension part; a first exhaust port 12 connected to a first exhaust system for reducing the pressure of the first space in the substrate treatment; and a second exhaust port 140 connected to a second exhaust system for reducing the pressure of the second space in the substrate treatment. <P>COPYRIGHT: (C)2013,JPO&INPIT |
