发明名称 RADIATION CURABLE AQUEOUS COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide homogeneous, monomer and solvent free, UV/EB curable aqueous formulations which provide high solvent resistance and have insignificant odor and/or low levels of extractable components. <P>SOLUTION: There is provided a method for producing a solvent resistant, low-extractable, film from an actinic radiation curable homogenous aqueous composition containing a water soluble compound, having at least one alpha, beta-ethylenically unsaturated radiation polymerizable double bond, and water as essential components. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013082930(A) 申请公布日期 2013.05.09
申请号 JP20120273149 申请日期 2012.12.14
申请人 SUN CHEMICAL CORP 发明人 CHATTERJEE SUBHANKAR;LAKSIN MIKHAIL;BIRO DAVID;TURGIS JEAN DOMINIQUE
分类号 C08F2/00;C08F283/00;C08F290/06;C08F291/00;C09D11/10;G03F7/004;G03F7/027;G03F7/038 主分类号 C08F2/00
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