发明名称 |
OPTICAL ELEMENT, LITHOGRAPHIC APPARATUS INCLUDING SUCH OPTICAL ELEMENT AND DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY |
摘要 |
An optical element includes a top layer which is transmissive for EUV radiation with wavelength in the range of 5-20 nm, and a structure of the top layer is a structure having an rms roughness value equal to or larger than lambda/10 for spatial periods equal to or smaller than lambda/2. The structure promotes transmission through the top layer to the optical element.
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申请公布号 |
US2013115419(A1) |
申请公布日期 |
2013.05.09 |
申请号 |
US201213662206 |
申请日期 |
2012.10.26 |
申请人 |
BAKKER LEVINUS PIETER;ASML NETHERLANDS B.V. |
发明人 |
BAKKER LEVINUS PIETER |
分类号 |
G02B5/02;G03F7/20;G02B1/11;G02B5/00;G02B5/08;H01L21/027 |
主分类号 |
G02B5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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