| 发明名称 |
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition having an excellent pattern collapse resistance (PCM). <P>SOLUTION: The compound is represented by formula (I). The resin has a structural unit derived from the compound. The resist composition and the method for producing the resist pattern are also provided. [In the formula, Q<SP POS="POST">i1</SP>and Q<SP POS="POST">i2</SP>are each independently fluorine or 1-6C perfluoroalkyl; n is 0 or 1; m1 and m2 are each independently 0 or 1; X<SP POS="POST">1</SP>is a single bond or 1-10C alkanediyl wherein the methylene constituting the alkanediyl may be substituted with oxygen or carbonyl, with the proviso that when n is 0, X<SP POS="POST">1</SP>is not the single bond; R<SP POS="POST">1</SP>is hydrogen or methyl; and Z<SP POS="POST">1+</SP>is an organic counter ion]. <P>COPYRIGHT: (C)2013,JPO&INPIT |
| 申请公布号 |
JP2013082894(A) |
申请公布日期 |
2013.05.09 |
| 申请号 |
JP20120195029 |
申请日期 |
2012.09.05 |
| 申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
ICHIKAWA KOJI;YOSHIDA MASASHI |
| 分类号 |
C08F12/30;C07C309/17;C07C381/12;G03F7/004;G03F7/039 |
主分类号 |
C08F12/30 |
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