| 发明名称 |
RESIST COMPOSITION AND METHOD OF MANUFACTURING RESIST PATTERN |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition to manufacture a resist pattern with excellent line edge roughness. <P>SOLUTION: A resist composition contains a compound represented by the formula (I), resin and an acid generation agent. The resin contains a structural unit represented by the formula (a1-0) and is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in the aqueous alkali solution by the action of acid. <P>COPYRIGHT: (C)2013,JPO&INPIT |
| 申请公布号 |
JP2013083957(A) |
申请公布日期 |
2013.05.09 |
| 申请号 |
JP20120207889 |
申请日期 |
2012.09.21 |
| 申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
SUGIHARA MASAKO;ANDO NOBUO;YAMASHITA HIROKO |
| 分类号 |
G03F7/039;C08F20/18;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
